Patent · US Expired

Photocurable composition, process for producing photocurable resin, and crosslinked product

US6924324B2 · kind B2 · utility

5Cited by
1References
11Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 7, 2003
Grant dateAug 2, 2005
Priority date
Expiry dateMar 30, 2023

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/2852
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

A photocurable composition is provided which yields an excellent tack-free, hard cured product without any addition of photoinitiators. A photocurable composition which is excellent in storage stability is also provided. The photocurable composition contains a resin having an acryloyl group and a chemical structure element selected from the group consisting of β-diketone groups and β-ketoester groups, wherein the β-diketone group or the β-ketoester group has a tetra-substituted carbon atom between two carbonyl groups, which is capable of generating one or two free radicals under photoirradiation, and the photocurable composition does not increase more than 25% in viscosity when heated at 60° C. for 5 days.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.