Flat panel display device and method of forming passivation film in the flat panel display device
US6926572B2 · kind B2 · utility
21Cited by
6References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 30, 2002 |
| Grant date | Aug 9, 2005 |
| Priority date | — |
| Expiry date | Feb 3, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K59/8731
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of forming a passivation film in a flat panel display device includes forming the flat panel display device on a substrate, bringing the flat panel display device into a chamber in order to form the passivation film, injecting precursors containing constituent elements of the passivation film into the chamber where the precursors include at least oxygen plasma, ammonia plasma, or nitrogen plasma, and forming the passivation film of an inorganic insulating material at a temperature of 20-220° C. through a surface chemical reaction between the precursors by a plasma enhanced atomic layer deposition method.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.