Electron beam apparatus and spacer for reducing electrostatic charge
US6927533B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 7, 1999 |
| Grant date | Aug 9, 2005 |
| Priority date | — |
| Expiry date | Oct 7, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2329/866
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electron beam apparatus including a hermetic container provided with an electron source, in which, when a first member is arranged in the hermetic container, at least part of the first member is coated with a film, and the film is configured in such a manner that it includes two regions, a first region and a second region different in electron density from the first region and the second region forms a network in the first region. This three-dimensional network structure allows a member being charged to be preferably controlled. Thereby, it is possible to control the effects of a member being charged which is used in an electron beam apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.