Projection exposure device and position alignment device and position alignment method
US6927854B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 16, 2003 |
| Grant date | Aug 9, 2005 |
| Priority date | — |
| Expiry date | Aug 17, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7065
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A mask mark is irradiated by an ultra-violet light source, thereby the image of the mark is passed through a lens and a half-mirror, then reflected by a mirror, thereafter further passed through a beam splitter and a lens, forming an image on a CCD. Then the center coordinate of the image is measured by a device, next, a board mark is illuminated by an infrared light source, and its image is passed through the mirror, the half-mirror, the beam splitter, a reflector, a lens, and a beam splitter, forming an image on a CCD. The positional alignment is implemented by moving the mobile stage in the XYθ directions based on the board mark on the infrared CCD and the mask mark on the ultra-violet CCD.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.