Fluorinated photopolymer composition and waveguide device
US6929899B2 · kind B2 · utility
17Cited by
18References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 18, 2002 |
| Grant date | Aug 16, 2005 |
| Priority date | — |
| Expiry date | Feb 18, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/117
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A photosensitive composition having low absorption loss at 1,300-1,610 nm and is suitable for practical waveguide devices. The composition comprises at least one (meth)acrylate prepared from a fluorinated monomer or polymer having minimum two hydroxyl groups, at least one multifunctional non-fluorinated (meth)acrylate and at least one photoinitiator. An optical coating on a variety of substrates is obtained by exposing the photosensitive composition to actinic radiation such as UV light. An optical waveguide device is fabricated by patterning the photosensitive composition on a substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.