Method of manufacturing diffractive optical element
US6930834B2 · kind B2 · utility
8Cited by
4References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 21, 2001 |
| Grant date | Aug 16, 2005 |
| Priority date | — |
| Expiry date | Mar 20, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0035
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of manufacturing a diffractive optical element, including a process for forming a resist mask of blazed shape upon a substrate and for etching the substrate by use of the resist mask so that the blazed shape is transferred to the substrate. The method includes a process for forming, before the etching, an element being effective to prevent a taper shape, to be produced at an edge of the blazed shape of the resist mask, from being transformed to the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.