Method of forming a dielectric substrate having a multiturn inductor
US6931712B2 · kind B2 · utility
4Cited by
19References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 14, 2004 |
| Grant date | Aug 23, 2005 |
| Priority date | — |
| Expiry date | Jan 14, 2024 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49155
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A dielectric substrate having an embedded inductor wherein each turn of the inductor traverses several layers such that the top and bottom of each turn of the inductor are parallel to each other but are in different layers and the sides of each turn of the inductor traverse at least one layer to connect the top and bottom of the inductor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.