System and method for forming a pattern on plain or holographic metallized film and hot stamp foil
US6932451B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Feb 18, 2003 |
| Grant date | Aug 23, 2005 |
| Priority date | — |
| Expiry date | Feb 18, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S283/901
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The system and method of the present invention forms an item specific pattern on a plain or holographic metallized film or hot stamp foil, including an embossed substrate with or without holograms. A piezoelectric ink jet printhead includes a plurality of ink jet channels and respective ink jets that receive an etchant-resistant mask material for ejecting etchant-resistant mask material through the respective ink jets onto a metallized surface of the metallized film or hot stamp foil. A controller individually and digitally controls the ejection of etchant-resistant mask material in a programmed manner for ink jet printing on the metallized surface a unique pattern of etchant or etchant-resistant mask. Etchant etches the metallized surface into an item specific pattern using subsequently applied etchant that exposes the metallized surface devoid of the etchant-resistant mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.