Radiation-sensitive recording material having a structured back
US6936404B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 13, 2001 |
| Grant date | Aug 30, 2005 |
| Priority date | — |
| Expiry date | Aug 23, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/092
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention relates to a recording material for the production of offset printing plates, having a web- or plate-form support, a radiation-sensitive layer on the front of the support and a continuous, pigment particle-free layer on the back of the support. The back layer essentially consists of an organic polymeric material having a glass transition temperature Tg of at least 45° C., and its surface has a Bekk smoothness of from 5 to 800 s. It also relates to a process for the production of this recording material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.