System and methods for manufacturing a molecular film pattern
US6939665B2 · kind B2 · utility
6Cited by
1References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 27, 2001 |
| Grant date | Sep 6, 2005 |
| Priority date | — |
| Expiry date | May 16, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K59/12
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention provides an organic silane molecular film, having a thickness of 3 nm or less and an aromatic hydrocarbon group as a part of the molecular structure of the film that is formed on the surface of the substrate. Accordingly, a molecular film pattern can be efficiently formed by using a molecular film having a superior photolytic property. Additionally, the invention can provide a patterning technique that can easily form a molecular film pattern at a high speed with the number of steps of manufacturing a semiconductor device, as well as the cost, being reduced.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.