Method of producing an integral resonator sensor and case
US6944931B2 · kind B2 · utility
54Cited by
19References
51Claims
0Family size
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Key dates
| Filing date | Aug 12, 2003 |
| Grant date | Sep 20, 2005 |
| Priority date | — |
| Expiry date | Aug 12, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/4902
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present invention discloses an inertial sensor having an integral resonator. A typical sensor comprises a planar mechanical resonator for sensing motion of the inertial sensor and a case for housing the resonator. The resonator and a wall of the case are defined through an etching process. A typical method of producing the resonator includes etching a baseplate, bonding a wafer to the etched baseplate, through etching the wafer to form a planar mechanical resonator and the wall of the case and bonding an end cap wafer to the wall to complete the case.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.