Method of forming a magnetoresistive device
US6944938B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 29, 2004 |
| Grant date | Sep 20, 2005 |
| Priority date | — |
| Expiry date | Oct 29, 2024 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49798
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method of forming a head comprises forming a write transducer on a wafer, cutting the wafer to produce a slider bar with a cut surface, and planarizing the cut surface of the slider bar. Forming the write transducer can include forming a first pole layer and forming a first pole pedestal layer over the first pole layer, where the first pole pedestal layer includes a tapered portion defined by a first end having a nose width less than a desired final nose width, and a second end having a zero throat width greater than the desired final nose width. Planarizing the cut surface of the slider bar exposes the first pole pedestal layer until a width thereof approximately equals the desired final nose width.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.