Optical waveguide in the interior of silica glass and method of forming optical waveguide
US6945078B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 21, 2003 |
| Grant date | Sep 20, 2005 |
| Priority date | — |
| Expiry date | Aug 21, 2023 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C23/0025
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
When an optical waveguide is formed by focused femtosecond laser pulses in a pure silica glass to induce a refractive index increase region, a pulse width of femtosecond laser pulses are changed, a peak power of femtosecond laser pulses at the focal point is changed, or both the pulse width and the peak power are changed simultaneously. Under conditions where a pulse width of the femtosecond laser pulses is in a range of 210 to 420 fs and a peak power at the focal point is not greater than 8.7×1011 W/cm2, an optical waveguide having a mode field of 10 to 14 μm such that an aspect ratio is 1 (one) can be obtained. By doing this, it is possible to control a mode field diameter of an optical waveguide and an aspect ratio of the mode field diameter.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.