Patent · US Expired

Laser processing method and laser processing apparatus

US6946620B2 · kind B2 · utility

5Cited by
9References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 4, 2003
Grant dateSep 20, 2005
Priority date
Expiry dateSep 5, 2023

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB23K26/389
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

In a laser processing apparatus including an ultra-short pulse laser a focusing optical system and processing a work by projecting a beam delivered through the focusing optical system on to the work, the focusing optical system has at least a pair of diffractive surface and a refractive surface, and chromatic aberration is corrected or chromatic aberration and pulse extension are corrected by making use of the diffractive dispersions due to and the diffractive surface the refractive dispersion due to of the refractive surface. With this arrangement, chromatic aberration is corrected or both chromatic aberration and pulse expansion are corrected in the processing with the ultra-short pulse laser and thereby improve the practical use and value of the processing by improving its accuray, qualiy and speed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.