Method for measuring product parameters of components formed on a wafer and device for performing the method
US6946864B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 19, 2002 |
| Grant date | Sep 20, 2005 |
| Priority date | — |
| Expiry date | Jul 1, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/66
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A measuring arrangement for measuring product parameters of a component in the epitaxial layer (28) of a wafer comprises measuring probe (3) on whose contact side (23) a recess (24) is installed, into which an electrolyte can be poured. The electrolyte produces an electrical connection between a contact body (11), which is charged with a signal from a pulsed-current source, and the surface (22) of the wafer (2). A detector (16) serves for detecting the light which is emitted by the component.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.