Methods to make diffractive optical elements
US6947224B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 19, 2003 |
| Grant date | Sep 20, 2005 |
| Priority date | — |
| Expiry date | Sep 19, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B5/1857
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for forming a diffractive lens includes forming an etch stop layer on a first surface of a silicon substrate, forming a diffractive optical element above the etch stop layer, forming a planarization layer covering the diffractive optical element, planarizing the planarization layer, forming a bonding layer on the planarization layer, bonding a transparent substrate on the bonding layer, and etching a second surface of the silicon substrate to the etch stop layer to remove a portion of the silicon substrate opposite the diffractive optical element, wherein the remaining portion of the silicon substrate forms a bonding ring.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.