Use of a composition in stereolithography
US6951700B2 · kind B2 · utility
1Cited by
8References
29Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 30, 2000 |
| Grant date | Oct 4, 2005 |
| Priority date | — |
| Expiry date | Nov 30, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/027
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
The use of a compound of formula (A), which comprises a group of sub-formula (I) where R1, R2, R3, R4, R5, R6, X1 and Y1 are various specified organic groups wherein at least one of said groups has sufficient electron whitdrawing properties to activate the multiple bonds to polymerisation, in a stereolithographic composition. Stereolithographic applications of these compounds are also described and claimed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.