Process for protection of the surface of a fixed contact for a semiconductor color image sensor cell during a coloring process
US6951772B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 18, 2003 |
| Grant date | Oct 4, 2005 |
| Priority date | — |
| Expiry date | Feb 16, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10F77/413
Abstract
The invention relates to a process for making a semiconductor color image sensor cell comprising a metal layer in which a fixed contact is defined, an anti-reflecting layer covering the metal layer and a passivation layer covering the assembly. The method includes etching the passivation layer and stopping on the anti-reflecting layer so as to form a hole for the opening of the fixed contact; forming at least one colored filter element on a region of the passivation layer, the anti-reflecting layer then acting as a protection layer for the surface of the fixed contact; depositing a planarizing resin layer so as to cover the colored filter elements; forming micro-lenses on the planarizing resin layer above the colored filter elements; and etching the anti-reflecting layer to open the fixed contact.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.