Method for densifying porous substrates by chemical vapour infiltration with preheated gas
US6953605B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 26, 2001 |
| Grant date | Oct 11, 2005 |
| Priority date | — |
| Expiry date | Jan 1, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S427/10
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for densification of porous by CVI in which substrates are loaded into a loading zone of an oven and heated to a temperature at which a desired matrix material is formed from a precursor gas(es). A reative gas containing the precursor gas(es) is admitted into the end of the oven and heated upstream from the loading zone of the substrates. The reactive gas is also preheated prior to entering the oven so that, upon entering the oven, it is brought to an intermediate temperature between ambient temperature and the temperature to which the substrates are heated. In this manner, a very small temperature gradient is obtained throughout the loading zone.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.