Photosensitive composition for photoresist manufacture
US6953649B2 · kind B2 · utility
29Cited by
9References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 1, 2001 |
| Grant date | Oct 11, 2005 |
| Priority date | — |
| Expiry date | Nov 17, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/106
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
The invention concerns a novel photosensitive composition for photoresist and a system comprising a substrate and a photoresist obtained from said novel composition. The photosensitive composition for photoresist comprises a copolymer with hydrophobic blocks whereof at least one block is an hydrophobic block capable of generating a hydrophilic block and comprising at its end a group selected among dithioesters, thioesters-thiones, dithiocarbamates and xanthates, and a photoactive compound capable of generating under the effect of a radiation an active species reacting with the hydrophobic block to generate the hydrophilic block.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.