Scanning probe based lithographic alignment
US6955767B2 · kind B2 · utility
33Cited by
8References
14Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 22, 2001 |
| Grant date | Oct 18, 2005 |
| Priority date | — |
| Expiry date | Oct 20, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/887
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The lithographic process described herein involves aligning a patterned mold with respect to an alignment mark that is disposed on a substrate based upon interaction of a scanning probe with the alignment mark. By this method, the patterned mold may be aligned to an atomic accuracy (e.g., on the order of 10 nm or less), enabling nanometer-scale devices to be fabricated. A device formed by this lithographic method and a system for implementing this lithographic method with alignment also are described.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.