Electromagnetic radiation generation using a laser produced plasma
US6956885B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 30, 2001 |
| Grant date | Oct 18, 2005 |
| Priority date | — |
| Expiry date | Aug 30, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0086
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
An extreme ultraviolet radiation generator is disclosed in which Xenon gas is continuously ejected from a high pressure nozzle into a low pressure chamber to generate Xenon atom clusters which are irradiated with a high repetition rate pulsed laser to form a plasma and yield quasi-continuous EUV generation. The nozzle has a beveled outer rim to enable the focus point of the laser light to be brought close to the nozzle. The nozzle is cooled to a temperature at which background Xenon gas condenses onto the nozzle forming a protective layer. A gas compressor serves to recirculate the Xenon gas and batch purification triggered by a mass spectrometer monitoring gas purity may be periodically applied.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.