Polishing film and method of producing same
US6958082B2 · kind B2 · utility
1Cited by
3References
1Claims
0Family size
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Key dates
| Filing date | Feb 21, 2003 |
| Grant date | Oct 25, 2005 |
| Priority date | — |
| Expiry date | Feb 21, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/2993
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A polishing film includes a plastic film and a polishing layer formed on its surface, having a mixture of a first group of silica particles with a first average diameter and a second group of silica particles with a second average diameter fixed in a resin binder, the first average diameter and the second diameter being different from each other and both within a range of 0.001-10 μm. The mixture of the two groups of silica particles has a granularity distribution curve with two peaks at two different diameter values corresponding to the first and second average diameters.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.