Patent · US Expired

Apparatus for cleaning residual material from an article

US6960282B2 · kind B2 · utility

2Cited by
14References
22Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 21, 2001
Grant dateNov 1, 2005
Priority date
Expiry dateSep 15, 2022

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH05K2203/1572
  • WIPO fieldAudio-visual technology
  • WIPO sectorElectrical engineering

Abstract

An apparatus in which opposed nozzle assemblies are utilized to clean residual material, such as a metallic paste, from an article, such as a screening mask. Each of the nozzle assemblies has a first set of nozzles for spraying a cleaning agent onto the article in a first pattern to first chemically and mechanically remove residual material from the article. At least one of the nozzle assemblies has a second set of nozzles for spraying a cleaning agent onto the article in a second pattern while simultaneously applying a voltage between the second set of nozzles and the article to then chemically and electrolytically remove the remaining residual material from the article.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.