Method for homogenizing the exposure of the different beams in a multi beam plotter
US6961146B1 · kind B1 · utility
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4References
9Claims
0Family size
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Key dates
| Filing date | Nov 22, 2000 |
| Grant date | Nov 1, 2005 |
| Priority date | — |
| Expiry date | Mar 9, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06K15/1247
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
Disclosed are methods and apparatus for homogenizing the exposure of different beams in a multi beam-plotter. The plotter typically operates on films or plates.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.