Method and device for drying substrate
US6962007B1 · kind B1 · utility
7Cited by
8References
7Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Aug 10, 1999 |
| Grant date | Nov 8, 2005 |
| Priority date | — |
| Expiry date | Aug 10, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67034
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A device for drying substrates which stores a plurality of substrate (1) and which comprises a processing container (3) to which cleaning fluid (2) after cleaning the substrates (1) is drained and an injection nozzle (5) for injecting drying fluid located at the terminating part of a feed pipe (4) through which liquid drying fluid is supplied, whereby an exhaust equipment is eliminated or simplified, and the drying fluid is fed smoothly.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.