Processes and apparatuses for treating halogen-containing gases
US6962679B2 · kind B2 · utility
6Cited by
12References
81Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 11, 2001 |
| Grant date | Nov 8, 2005 |
| Priority date | — |
| Expiry date | Jul 9, 2022 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01D2259/818
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
There are disclosed various processes, apparatuses and systems for treating a halogen-containing gas such as F2 that involve generating a plasma in order to reduce chemically the halogen-containing gas into products that are more environmentally manageable. According to a particular embodiment, a reducing agent is mixed with the halogen-containing gas to produce a feed gas mixture and a non-thermal plasma is generated in the feed gas mixture in the presence of liquid water.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.