System configured for applying multiple modifying agents to a substrate
US6962731B2 · kind B2 · utility
4Cited by
28References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 23, 2003 |
| Grant date | Nov 8, 2005 |
| Priority date | — |
| Expiry date | Dec 3, 2023 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05D2401/90
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention is related to the modifying of substrates with multiple modifying agents in a single continuous system. At least two processing chambers are configured for modifying the substrate in a continuous feed system. The processing chambers can be substantially isolated from one another by interstitial seals. Additionally, the two processing chambers can be substantially isolated from the surrounding atmosphere by end seals. Optionally, expansion chambers can be used to separate the seals from the processing chambers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.