High selectivity colloidal silica slurry

US6964600B2 · kind B2 · utility

Assignee

• Praxair Technology, Inc. · US

Inventors

• Irina Belov · Zionsville, US
• Lothar Puppe · Burscheid, DE
• Gerd Passing · Wermelskirchen, DE
• Thomas J. Hunt · Peekskill, US

Key dates

• Filing date: Nov 21, 2003
• Grant date: Nov 15, 2005
• Expiry date: Feb 18, 2024

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C09K3/1463
• WIPO field: Basic materials chemistry
• WIPO sector: Chemistry

Abstract

Provided is a novel high selectivity aqueous slurry composition method of utilizing same. The composition includes non-modified silica based abrasive particles in an amount of about 5 to about 50 weight percent, and an organic compound in an amount of about 0.001 to about 2.0 weight percent in an aqueous solution, wherein the silicon oxide to silicon nitride selectivity ratio ranges from about 50 to about 700.