Patterning methods and systems using reflected interference patterns
US6967067B2 · kind B2 · utility
1Cited by
10References
63Claims
0Family size
Assignee
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Key dates
| Filing date | Mar 9, 2004 |
| Grant date | Nov 22, 2005 |
| Priority date | — |
| Expiry date | Mar 9, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03H2260/63
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for patterning a layer on a substrate can include projecting coherent radiation toward a reflector surface so that the coherent radiation is reflected off the reflector surface to provide a holographic projection of a desired image wherein the reflector surface includes information that corresponds to an inverse of the holographic projection of the desired image. The substrate including the layer can be maintained in the path of the reflected radiation so that the holographic projection is projected onto the layer. Related systems are also discussed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.