Patent · US Expired

Method for the electron-microscopic observation of a semiconductor arrangement and apparatus therefor

US6967328B2 · kind B2 · utility

12Cited by

14References

21Claims

0Family size

Assignee

Carl Zeiss NTS GmbH · US

Inventors

Oliver Kienzle · Aalen, DE
Rainer Knippelmeyer · Utting am Ammersee, DE
Ingo Muller · Erkner, DE

Key dates

Filing date	Jul 9, 2003
Grant date	Nov 22, 2005
Priority date	—
Expiry date	Oct 11, 2023

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/2817
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A method for the electron-microscopic observation of a semiconductor arrangement is provided. It includes providing an electron microscopy optics for imaging secondary electrons emanating from the semiconductor arrangement within an extended object field on a position-sensitive detector, providing an illumination device for emitting a primary energy beam, directing the primary energy beam to at least the object field for extracting there secondary electrons from the semiconductor arrangement. The semiconductor arrangement comprises a region with an upper surface provided by a first material and a recess with a high aspect ratio which is surrounded by the upper surface and has a bottom provided by a second material.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.