Patent · US Expired

Micro-lens array with precisely aligned aperture mask and methods of producing same

US6967779B2 · kind B2 · utility

82Cited by
77References
75Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 3, 2003
Grant dateNov 22, 2005
Priority date
Expiry dateJun 3, 2023

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03B21/625
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A micro-lens array with a precisely aligned aperture mask, and a method of forming the same, is provided. The aperture mask is formed by projecting light onto a mask layer using each lenslet in the micro-lens array. The intensity of the light and the mask layer material are chosen so that the light forms apertures in the mask layer via a non-ablative process. The resulting apertures are automatically aligned with their respective lenslets.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.