Method and system for automatically deriving stippling stitch designs in embroidery patterns
US6968255B1 · kind B1 · utility
28Cited by
2References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 27, 2004 |
| Grant date | Nov 22, 2005 |
| Priority date | — |
| Expiry date | Nov 7, 2024 |
Classification
- Technology area (CPC D)Textiles; Paper
- CPC primaryD05B19/08
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
The invention pertains to a method of applying a stippling stitch design to an area defining an asymmetrical polygon in a coordinate planar display format, involving: defining a pathway, which may be based on a fractal design, within a geometrically symmetrical boundary, the pathway comprising a single non-intersecting line; conforming the pathway to an asymmetrical polygon area substantially disposed within the geometrically symmetrical boundary; deriving a plurality of coordinate points representative of the pathway; and passing the points to a data storage medium in a pre-determined embroidery data format.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.