Patent · US Expired

Process for production of a dielectric multi-layered reflecting coating

US6972065B1 · kind B1 · utility

6Cited by
8References
17Claims
0Family size

Assignee

Inventor

Key dates

Filing dateMar 24, 2000
Grant dateDec 6, 2005
Priority date
Expiry dateMar 24, 2020

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T156/1002
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

A method of producing a dielectric multilayer mirror coating is characterized with a view to increasing the coefficient of reflection by the following steps: to begin with, at least two dielectric layers of predetermined initial thicknesses are produced. Subsequently, the layers are arranged one above the other for forming a layered stack. Finally, the thickness of the stack of layers and thus the thicknesses of the individual layers are reduced by deforming the layered stack while maintaining the thickness ratio or ratios of the layers relative to one another.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.