Compositions for microlithography

US6974657B2 · kind B2 · utility

Assignee

• E.I. DU PONT DE NEMOURS AND COMPANY · US

Inventors

• Larry Berger · Chadds Ford, US
• Michael Karl Crawford · Glen Mills, US
• Jerald Feldman · Wilmington, US
• Lynda Kaye Johnson · Wilmington, US
• Frank Leonard Schadt, III · Wilmington, US
• Fredrick Claus Zumsteg, Jr. · Wilmington, US

Key dates

• Filing date: Oct 16, 2001
• Grant date: Dec 13, 2005
• Expiry date: Oct 16, 2021

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S430/108
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A fluorine-containing polymer prepared from at least a spacer group selected from the group consisting of ethylene, alpha-olefins, 1,1′-disubstituted olefins, vinyl alcohols, vinyl ethers, and 1,3-dienes; and a norbornyl radical containing a functional group containing the structure: —C(Rf)(Rf′)Orb wherein Rf and Rf′ are the same or different fluoroalkyl groups of from 1 to about 10 carbon atoms or taken together are (CF2)n wherein n is an integer ranging from 2 to about 10 and Rb is a hydrogen atom or an acid- or base-labile protecting group; r is an integer ranging from 0-4. The fluorine-containing polymer has an absorption coefficient of less than 4.0 mm−1 at a wavelength of 157 nm. These polymers are useful in photoresist compositions for microlithography. They exhibit high transparency at this short wavelength and also possess other key properties, including good plasma etch resistance and adhesive properties.