Semiconductor device
US6975142B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 17, 2002 |
| Grant date | Dec 13, 2005 |
| Priority date | — |
| Expiry date | Apr 17, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH03K19/01721
- WIPO fieldBasic communication processes
- WIPO sectorElectrical engineering
Abstract
There is provided a semiconductor device in which fabrication steps can be reduced by constructing a circuit using only TFTs of one conductivity type and in which a voltage amplitude of an output signal can be normally obtained. A capacitance (205) is provided between a gate and a source of a TFT (203) connected to an output node, and a circuit formed of TFTs (201) and (202) has a function to bring a node a into a floating state. When the node α is in the floating state, a potential of the node a is caused higher than VDD by using gate-source capacitance coupling of the TFT (203) through the capacitance (205), thus an output signal having an amplitude of VDD-GND can be normally obtained without causing amplitude attenuation due to the threshold value of the TFT.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.