Photosensitive material for immersion photolithography
US6977135B2 · kind B2 · utility
1Cited by
1References
35Claims
0Family size
Inventor
Key dates
| Filing date | Feb 10, 2004 |
| Grant date | Dec 20, 2005 |
| Priority date | — |
| Expiry date | Jul 24, 2024 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09K2323/00
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
When rays of light converge inside a photosensitive material at angles larger than 70 degrees, one polarization of the light may fail to produce the desired image contrast in conventional exposure media. This invention describes means of suppressing the effects of the undesired polarization by using a class of photosensitive media that are insensitive to that polarization and more sensitive to the polarization conveying the desired image contrast as well as by means of optical configurations relevant in the context of semiconductor manufacturing using photolithography.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.