Direct writing of optical devices in silica-based glass using femtosecond pulse lasers
US6977137B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 17, 2001 |
| Grant date | Dec 20, 2005 |
| Priority date | — |
| Expiry date | Jun 11, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/146
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention relates to methods of writing a light-guiding structure in a bulk glass substrate. The bulk glass substrate is preferably made from a soft silica-based material having an annealing point less than about 1380° K. A pulsed laser beam is focused within the substrate while the focus is translated relative to the substrate along a scan path at a scan speed effective to induce an increase in the refractive index of the material along the scan path. Substantially no laser-induced physical damage of the material is incurred along the scan path. Various optical devices can be made using this method.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.