Patent · US Expired

Direct writing of optical devices in silica-based glass using femtosecond pulse lasers

US6977137B2 · kind B2 · utility

13Cited by
24References
8Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 17, 2001
Grant dateDec 20, 2005
Priority date
Expiry dateJun 11, 2023

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S430/146
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

The invention relates to methods of writing a light-guiding structure in a bulk glass substrate. The bulk glass substrate is preferably made from a soft silica-based material having an annealing point less than about 1380° K. A pulsed laser beam is focused within the substrate while the focus is translated relative to the substrate along a scan path at a scan speed effective to induce an increase in the refractive index of the material along the scan path. Substantially no laser-induced physical damage of the material is incurred along the scan path. Various optical devices can be made using this method.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.