Method for lithographic processing on molecular monolayer and multilayer thin films
US6979639B2 · kind B2 · utility
1Cited by
5References
13Claims
0Family size
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Key dates
| Filing date | Mar 16, 2004 |
| Grant date | Dec 27, 2005 |
| Priority date | — |
| Expiry date | Mar 16, 2024 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31663
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Methods for making electronic devices where a molecular monolayer or multilayer is sandwiched between top and bottom electrodes at electrode intersections. The molecular layer has an electrical characteristic such as bistable switching. A layer of electrically conductive material is used to protect the molecular layer during formation of the top electrode pattern. The electrically conductive material remains sandwiched between the top and bottom electrodes at the electrode intersections in the final electronic device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.