High-flux entangled photon generation via parametric processes in a laser cavity

US6982822B2 · kind B2 · utility

Assignees

• TRUSTEES OF BOSTON UNIVERSITY · US
• The Trustees of Boston College · US
• Carl Zeiss Jena GmbH · DE

Inventors

• Malvin Teich · Boston, US
• Bahaa Saleh · Lexington, US
• Alexander Sergienko · Boston, US
• John T. Fourkas · Bethesda, US
• Ralf Wolleschensky · Jena, DE
• Michael Kempe · Jena, DE
• Mark C. Booth · Cambridge, US

Key dates

• Filing date: May 22, 2003
• Grant date: Jan 3, 2006
• Expiry date: Sep 21, 2023

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01S3/1095
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

An apparatus for generating a strong source of doubly or multiply entangled photons emitted non-collinearly or collinearly with respect to the pump light that is at frequency 2f includes a laser medium producing classical laser light at fundamental frequency f. A medium for second harmonic generation transforms the light at fundamental frequency f to its second-harmonic frequency 2f and emitting entangled photons non-colinearly with respect to the light at the second harmonic frequency. An optical cavity element around the laser medium and the medium for second harmonic generation includes of at least two mirrors that are highly reflective at the light frequencies f and 2f. A parametric process or a set of simultaneous parametric processes are used to generate the entangled photons at light frequencies around including at least one optical cavity resonant at frequency 2f at least around the medium for entangled photon generation, comprising of at least two mirrors that are highly reflective at the light frequency 2f.