Mirror holding mechanism in exposure apparatus, and device manufacturing method
US6982841B2 · kind B2 · utility
2Cited by
1References
25Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 13, 2004 |
| Grant date | Jan 3, 2006 |
| Priority date | — |
| Expiry date | Apr 20, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/7095
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed is a mirror holding system by which aberration resulting from deformation or positional deviation of an optical member, causing degradation of imaging performance, can be reduced whereby a desired optical performance is assured. Also disclosed is an exposure apparatus and a device manufacturing method based on such mirror holding system. The holding system includes a supporting member for supporting the optical element at a plurality of supports which are movable along an approximately radial direction about a predetermined point.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.