Electron beam apparatus using electron source, image-forming apparatus using the same and method of manufacturing members to be used in such electron beam apparatus
US6984160B2 · kind B2 · utility
4Cited by
16References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 15, 2004 |
| Grant date | Jan 10, 2006 |
| Priority date | — |
| Expiry date | Dec 26, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2329/866
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
This invention provides an arrangement for alleviating the electric charge of members apt to be electrically charged such as spacers used in an electron beam apparatus by arranging a high resistance film thereon. Particularly, the low resistance layer arranged at each of the members is covered by a high resistance film to suppress any electric discharges.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.