Pattern-based defect description method
US6985319B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 9, 2001 |
| Grant date | Jan 10, 2006 |
| Priority date | — |
| Expiry date | Dec 29, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B2220/20
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
The present invention provides a method of describing defects that requires less memory space than conventional methods. Entries of a first defect table are sorted according to the type of track layout, or zones. They are then grouped into clusters. Each cluster is characterized by a set of new parameters, including a starting sector, a scratch parameter, a span parameter, and an angle parameter. The new parameters are stored in a second table, replacing the corresponding entries in the first table. In this manner, a single entry in the second table replaces one or more entries in the first table with one entry in the first table.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.