Ultra-short ion and neutron pulse production
US6985553B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 23, 2003 |
| Grant date | Jan 10, 2006 |
| Priority date | — |
| Expiry date | Jan 23, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J27/16
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An ion source has an extraction system configured to produce ultra-short ion pulses, i.e. pulses with pulse width of about 1 μs or less, and a neutron source based on the ion source produces correspondingly ultra-short neutron pulses. To form a neutron source, a neutron generating target is positioned to receive an accelerated extracted ion beam from the ion source. To produce the ultra-short ion or neutron pulses, the apertures in the extraction system of the ion source are suitably sized to prevent ion leakage, the electrodes are suitably spaced, and the extraction voltage is controlled. The ion beam current leaving the source is regulated by applying ultra-short voltage pulses of a suitable voltage on the extraction electrode.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.