Polymers with mixed photoacid-labile groups and photoresists comprising same
US6989224B2 · kind B2 · utility
9Cited by
9References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 9, 2002 |
| Grant date | Jan 24, 2006 |
| Priority date | — |
| Expiry date | Oct 9, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/115
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention provides novel polymers and photoresist compositions that comprise the polymers as a resin component. Polymers of the invention contain two distinct groups which can undergo a deblocking reaction in the presence of photogenerated acid, wherein one of the deblocking moieties is an acetal group. The second photoacid-labile group is suitably an ester, particularly as provided by polymerization of an alkyl acrylate group, such as t-butylmethacrylate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.