Wavefront aberrator and method of manufacturing
US6989938B2 · kind B2 · utility
18Cited by
56References
21Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 20, 2004 |
| Grant date | Jan 24, 2006 |
| Priority date | — |
| Expiry date | Sep 20, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02C2202/14
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
The wavefront aberrator of the present invention includes a pair of transparent windows, or plates, separated by a layer of monomers and polymerization initiator, including a broad class of epoxies. This monomer exhibits a variable index of refraction across the layer, resulting from controlling the extent of its curing. Curing of the epoxy may be made by exposure to light, such as ultraviolet light. The exposure to light may be varied across the surface of the epoxy to create a particular and unique refractive index profile.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.