Patent · US Expired

Method for forming nanoscale features

US6995336B2 · kind B2 · utility

34Cited by
12References
39Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 26, 2004
Grant dateFeb 7, 2006
Priority date
Expiry dateMar 2, 2024

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB23K26/361
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

Here is presented a versatile technique for machining of nanometer-scale features using tightly-focused ultrashort laser pulses. By the invention, the size of features can be reduced far below the wavelength of light, thus enabling nanomachining of a wide range of materials. The features may be extremely small (<20 nm) and are highly reproducible.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.