Patent · US Expired

Near field optical probe having an internal near field generating and detecting device, and manufacturing method thereof

US6995350B2 · kind B2 · utility

1Cited by
3References
13Claims
0Family size

Assignees

Inventors

Key dates

Filing dateDec 2, 2002
Grant dateFeb 7, 2006
Priority date
Expiry dateDec 2, 2022

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB82Y35/00
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

In a near field optical probe, a through hole having an aperture is provided in a semiconductor photodetector including at least a first-conductive-type high-concentration impurity layer, a first-conductive-type low-concentration impurity layer and a second-conductivity impurity-introduced region.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.