Methods for fabricating three dimensional anisotropic thin films and products produced thereby
US6998331B2 · kind B2 · utility
1Cited by
8References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 21, 2003 |
| Grant date | Feb 14, 2006 |
| Priority date | — |
| Expiry date | Mar 21, 2023 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/543
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A three dimensional structure comprising at least two materials capable of being deposited by vapor deposition. The structure is fabricated by the controlled vapor deposition of the materials onto a substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.