Standoff/mask structure for electrical interconnect
US6998539B2 · kind B2 · utility
4Cited by
4References
25Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 27, 2003 |
| Grant date | Feb 14, 2006 |
| Priority date | — |
| Expiry date | May 7, 2024 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24843
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A multi-layer standoff/mask structure including a standoff having a plurality of standoff openings and a mask having a plurality of mask openings aligned with the standoff openings.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.